EUVL Infrastructure Development Center, Inc. (EIDEC) Adopts Defect Printability Simulation Software from Luminescent Technologies for its Mask Development Program
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EUVL Infrastructure Development Center, Inc. (EIDEC) Adopts Defect Printability Simulation Software from Luminescent Technologies for its Mask Development Program

Palo Alto : CA : USA | Jul 10, 2012 at 6:31 AM PDT
Source: PR Newswire
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DPS is an extremely fast simulator designed to reduce EUV mask development time by quickly and accurately simulating the effects of contamination, absorber, and buried multilayer defects...In addition, DPS includes an R&D version of Luminescent's Multilayer Defect Compensation (MDC) algorithm,... FULL ARTICLE AT PR Newswire
 
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